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Etude et simulation d’une décharge plasma à couplage inductif.

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dc.contributor.author Siari, Khadidja
dc.contributor.author Rebiai, Saïda
dc.date.accessioned 2022-05-24T09:52:41Z
dc.date.available 2022-05-24T09:52:41Z
dc.date.issued 2021-07-25
dc.identifier.uri http://depot.umc.edu.dz/handle/123456789/5794
dc.description.abstract The objective of the work presented in this thesis is a contribution to the development of electrical and hydrodynamic models allowing the modeling of the physical phenomena that occur in inductively coupled radiofrequency plasma discharges. It represents the development of a self-coherent fluid model in a GEC reference cell reactor which allows the determination of the distribution of different charged particles, electron temperature, electric field, and plasma potential, as well as to study the effect of discharge parameters, such as the composition of the gas, the pressure in the reactor as well as the appliedpower, in a reactive cold plasmas formed in discharges excited by an electric field, on the plasma properties. The model is developed using the COMSOL multiphysics software. The software is based on solving the first three moments of the Boltzmann equation (continuity equations, momentum transfer equation, and the energy of electrons equation) coupled to the Poisson and Maxwell’s equations, by the finite element method. The model is applied, at first, to study the properties of plasma created in a mixture of oxygen and argon. Then, it is used to analyze the effect of discharge conditions on the growth rate of silicon films deposited by ICP-CVD, from plasma composed of argon, hydrogen and silane.
dc.language.iso fr
dc.publisher Université Frères Mentouri - Constantine 1
dc.subject Électronique: Micro et Nanotechnologies
dc.subject Plasma à couplage inductif (ICP)
dc.subject Dépôt chimique en phase vapeur assisté par plasma
dc.subject COMSOL Multiphysics
dc.subject Cellule de référence GEC
dc.subject Films de silicium
dc.subject plasma haute densité
dc.subject basse pression
dc.subject taux de croissance
dc.subject Inductively coupled plasma (ICP)
dc.subject Plasma-enhanced chemical vapor deposition
dc.subject GEC reference cell
dc.subject Silicon films
dc.subject High-density plasma
dc.subject Low Pressure
dc.subject Deposition rate
dc.subject بلازما مقترنة حثيا (ICP)
dc.subject ترسيب بخار كميائي بمساعدة البلازما
dc.subject خلية مرجعية GEC
dc.subject طبقة سيليكون
dc.subject بلازما عالية الكثافة
dc.subject ضغط منخفض
dc.subject نسبة النمو
dc.subject COSMSOL
dc.title Etude et simulation d’une décharge plasma à couplage inductif.
dc.type Thesis

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