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OXYGEN PRESSURE DEPENDENT VO2 FILMS DEPOSITED BY A KRF LASER ON A CORNING GLASS
(Université des Frères Mentouri Constantine, 2013-12-16)
Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 1.5 Jcm-2. The substrate temperature and the target-substrate distance were set ...