Now showing items 1-4 of 4

    • Silicon Nanostructures Formation by V2O5 and HF Stain Etching 

      Ayat, M; Gabouze, N; Boarino, L; Guedouar, B (Université des Frères Mentouri Constantine, 2013-02-17)
      In this work we report the fabrication of silicon pillar array by a simple chemical etching of silicon in vanadium oxide/fluorhydric acid solution. Different etching parameters including the solution concentration, temperature ...
    • Silicon Nanostructures Formation by V2O5 and HF Stain Etching 

      Ayat, M; Gabouze, N; Boarino, L; Guedouar, B (Université des Frères Mentouri Constantine, 2013-02-17)
      In this work we report the fabrication of silicon pillar array by a simple chemical etching of silicon in vanadium oxide/fluorhydric acid solution. Different etching parameters including the solution concentration, temperature ...
    • SILICON NANOSTRUCTURES FORMATION BY V2O5 AND HF STAIN ETCHING 

      Ayat, M; Gabouze, N; Boarino, L; Guedouar, B (Université des Frères Mentouri Constantine, 2013-02-17)
      In recent years, much effort has been devoted to the manufacture of one dimensional nanostrutured materials for application in micro and nanodevices. Silicon is the basic material in microelectronics, and in recent years, ...
    • Texture Etching of Monocristalline Silicon in Sodium Hypochlorite Solution 

      Lounas, A; Nait Bouda, A; Menari, H; Gabouze, N (Université des Frères Mentouri Constantine, 2013-02-17)
      Alkaline etching has been widely used in silicon technology and applied for different purposes such as damaged layer removal from silicon surfaces, micro-membrane and complex micro-device fabrication for micro-sensor [1] ...