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    • Polyimide surface treatment by plasma deposition of organosilcon nano-thin layers 

      Nouicer, I; Sahli, S; Ziari, Z; Bellel, A. (Université des Frères Mentouri Constantine, 2013-02-17)
      Plasma enhanced chemical vapor deposition (PECVD) technique has been used to deposit organosilicon nano-thin layers on polyimide (PI) films substrates from hexamethyldisiloxane (HMDSO) precursor. The nano-thin layers ...