Now showing items 1-3 of 3

    • HIGHLY TEXTURED ZnO AND ZnO:V THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION 

      SMAALI, A; ABDELLI-MESSACI, S; LAFANE, S; KHEREDDINE, Y; KERDJA, T; KECHOUANE, M; NEMRAOUI, O (Université des Frères Mentouri Constantine, 2013-12-16)
      In this work ZnO and ZnO doped vanadium (1 - 6 %) thin films were deposited on glass substrate by the pulsed laser deposition technique. The films were deposited at 500°C under oxygen ambient pressure of 10-2 mbar with ...
    • OXYGEN PRESSURE DEPENDENT VO2 FILMS DEPOSITED BY A KRF LASER ON A CORNING GLASS 

      LAFANE, S; KERDJA, T; ABDELLI-MESSACI, S; MALEK, S; KHEREDDINE, Y (Université des Frères Mentouri Constantine, 2013-12-16)
      Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 1.5 Jcm-2. The substrate temperature and the target-substrate distance were set ...
    • THIN FILMS GROWTH FROM ALUMINA TARGET IRRADIATED BY A KrF LASER 

      YAHIAOUI, K; ABDELLI-MESSACI, S; MESSAOUD ABERKANE, S; KHEREDDINE, Y; KELLOU, H (Université des Frères Mentouri Constantine, 2013-12-16)
      We report on alumina thin films growth from α-Al2O3 target by pulsed laser deposition. The alumina plasma was induced by a KrF laser beam at a wavelength of 248 nm and pulse duration of 25 ns. The laser fluence was set ...