HIGHLY TEXTURED ZnO AND ZnO:V THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION

dc.contributor.author	SMAALI, A
dc.contributor.author	ABDELLI-MESSACI, S
dc.contributor.author	LAFANE, S
dc.contributor.author	KHEREDDINE, Y
dc.contributor.author	KERDJA, T
dc.contributor.author	KECHOUANE, M
dc.contributor.author	NEMRAOUI, O
dc.date.accessioned	2022-05-31T12:37:57Z
dc.date.available	2022-05-31T12:37:57Z
dc.date.issued	2013-12-16
dc.identifier.uri	http://depot.umc.edu.dz/handle/123456789/12836
dc.description.abstract	In this work ZnO and ZnO doped vanadium (1 - 6 %) thin films were deposited on glass substrate by the pulsed laser deposition technique. The films were deposited at 500°C under oxygen ambient pressure of 10-2 mbar with a laser fluence of 2 J/cm2. The study of structural properties of the films as a function of the vanadium concentration was investigated using XRD analysis. The patterns shows that all simples doped and undoped are completely c-axis oriented with a high crystalline quality. Influence of doping concentration in calculated grain size values was discussed
dc.language.iso	en
dc.publisher	Université Frères Mentouri - Constantine 1
dc.subject	Vanadium-doped ZnO
dc.subject	Pulsed Laser Deposition
dc.subject	X-ray Diffraction
dc.title	HIGHLY TEXTURED ZnO AND ZnO:V THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION
dc.type	Article