OXYGEN PRESSURE DEPENDENT VO2 FILMS DEPOSITED BY A KRF LASER ON A CORNING GLASS

dc.contributor.author	LAFANE, S
dc.contributor.author	KERDJA, T
dc.contributor.author	ABDELLI-MESSACI, S
dc.contributor.author	MALEK, S
dc.contributor.author	KHEREDDINE, Y
dc.date.accessioned	2022-05-30T10:32:45Z
dc.date.available	2022-05-30T10:32:45Z
dc.date.issued	2013-12-16
dc.identifier.uri	http://depot.umc.edu.dz/handle/123456789/12749
dc.description.abstract	Vanadium dioxide thin films have been deposited on Corning glass substrates by a KrF laser ablation of V2O5 target at the laser fluence of 1.5 Jcm-2. The substrate temperature and the target-substrate distance were set to 500°C and 4cm respectively. Xray diffraction analysis showed that pure VO2 is only obtained at an oxygen pressure range of 10-3 – 5 × 10-2 mbar. The structural films properties were correlated to the plume dynamics studied by fast imaging
dc.language.iso	en
dc.publisher	Université Frères Mentouri - Constantine 1
dc.subject	VO2
dc.subject	PLD
dc.subject	XRD
dc.subject	plume dynamics
dc.title	OXYGEN PRESSURE DEPENDENT VO2 FILMS DEPOSITED BY A KRF LASER ON A CORNING GLASS
dc.type	Article