Effect of bath pH on the electrodeposition of cuprous oxide and copper thin films for photovoltaic applications

dc.contributor.author	RAHAL, H
dc.contributor.author	RAHAL, S
dc.contributor.author	KIHAL, R
dc.contributor.author	AFFOUNE, A. M
dc.date.accessioned	2022-05-30T10:17:48Z
dc.date.available	2022-05-30T10:17:48Z
dc.date.issued	2013-02-17
dc.identifier.uri	http://depot.umc.edu.dz/handle/123456789/12527
dc.description.abstract	The electrodeposition of cuprous oxide (Cu2O) and copper (Cu) thin films at 29 °C on the ITO/glass substrates from cupric acetate aqueous solution is reported. The electrodeposition mechanism was investigated by cyclic voltammetry. The effect of pH on the electrodeposition of cuprous oxide and copper thin films was studied. The X-ray diffraction (XRD) analysis shows that Cu2O films has a cubic structure and the preferred growth orientation is the (111) direction. The photocurrent characterization indicated that the films deposited at pH = 6.2 has n-type electrical conductivity.
dc.language.iso	en
dc.publisher	Université Frères Mentouri - Constantine 1
dc.subject	Electrodeposition
dc.subject	thin film
dc.subject	cuprous oxide
dc.subject	copper
dc.subject	cyclic voltammetry
dc.subject	photovoltaic solar cells
dc.title	Effect of bath pH on the electrodeposition of cuprous oxide and copper thin films for photovoltaic applications
dc.type	Article