Nouicer, I; Sahli, S; Ziari, Z; Bellel, A.
(Université Frères Mentouri - Constantine 1, 2013-02-17)
Plasma enhanced chemical vapor deposition (PECVD) technique has been used to deposit organosilicon nano-thin layers on polyimide (PI) films substrates from hexamethyldisiloxane (HMDSO) precursor. The nano-thin layers ...