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    • SILICON NANOSTRUCTURES FORMATION BY V2O5 AND HF STAIN ETCHING 

      Ayat, M; Gabouze, N; Boarino, L; Guedouar, B (Université des Frères Mentouri Constantine, 2013-02-17)
      In recent years, much effort has been devoted to the manufacture of one dimensional nanostrutured materials for application in micro and nanodevices. Silicon is the basic material in microelectronics, and in recent years, ...